| 摘要 |
The invention involves the making of a group of apertures spaced in a precise manner on a structure and including, for example, a first aperture made in a first layer and a second aperture made in a second layer which covers the first layer, the first aperture being located within the second aperture. This involves:applying a first layer (41) of photosensitive resin,the etching of this resin layer by photolithography, by means of a single template, to leave a spot of resin (42) per group of apertures on the first layer (41), the exterior limits of the resin spot corresponding to the second aperture, and with the resin spot including an aperture (43) corresponding to the first aperture,vacuum application on the first layer (41) and on the remaining resin of material (44) which will make up the second layer, this application being done so that the part (45) of the first layer located at the bottom of the aperture (43) of the resin spot (42) is not covered by this deposit,the etching of the first layer (41) from the aperture (43) of the spot (42) to obtain the first aperture (46) in the first layer,elimination of the remaining resin and material covering it to obtain the second aperture in the second layer.
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