发明名称 |
STRUCTURE OF DOWNSCALED SURFACE WAVE PLASMA EQUIPMENT |
摘要 |
PURPOSE: A structure of downscaled surface wave plasma equipment is provided to maximize the use of a space, by rearranging constitutional factors protruded in a lateral direction and in a rear direction. CONSTITUTION: A pump(220) is transferred to be installed in a vacuum chamber. A VAT valve(210) is transferred to the center by the transferred and installed pump. A micro power generator is transferred to be installed in a position higher than the vacuum chamber. The micro power generator and the vacuum chamber are connected with a waveguide.
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申请公布号 |
KR20010078555(A) |
申请公布日期 |
2001.08.21 |
申请号 |
KR20000005902 |
申请日期 |
2000.02.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SEO, JEONG GEUN |
分类号 |
H01L21/30;(IPC1-7):H01L21/30 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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