发明名称 STRUCTURE OF DOWNSCALED SURFACE WAVE PLASMA EQUIPMENT
摘要 PURPOSE: A structure of downscaled surface wave plasma equipment is provided to maximize the use of a space, by rearranging constitutional factors protruded in a lateral direction and in a rear direction. CONSTITUTION: A pump(220) is transferred to be installed in a vacuum chamber. A VAT valve(210) is transferred to the center by the transferred and installed pump. A micro power generator is transferred to be installed in a position higher than the vacuum chamber. The micro power generator and the vacuum chamber are connected with a waveguide.
申请公布号 KR20010078555(A) 申请公布日期 2001.08.21
申请号 KR20000005902 申请日期 2000.02.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SEO, JEONG GEUN
分类号 H01L21/30;(IPC1-7):H01L21/30 主分类号 H01L21/30
代理机构 代理人
主权项
地址