发明名称 Photosensitive silver halide element with increased photosensitivity
摘要 A photosensitive element comprising a silver halide emulsion having silver halide grains containing an organic hole-trapping dopant. In a preferred embodiment said dopant is represented by formula (I):whereinR is hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group or hetero-aryl group, andM is hydrogen or any metal or organic group which can form a saltor by formula (II):wherein:X and Y are independently selected from O, S, Se, m is 1 and n is 1 or 2,R1 and R2 are hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl or aralkyl group or a substituted or unsubstituted heteroaryl group, wherein R1 and R2 may be the same or different and may form a ring,E represents a group linked to the carbon atom by a heteroatom, having at least one free electron pair,M+ is a proton or an organic or inorganic (metal) counterion.Moreover the invention provides a photosensitive element where said photosensitive element can be a photoaddressable thermographic element. The invention also provides a method for preparing said photosensitive element comprising a support and on one or both sides thereof at least one silver halide emulsion layer wherein the silver halide grains are doped with an organic hole-trapping dopant according to formula (I) or (II), optionally carried out in the presence of a oxidizing agent.
申请公布号 US6277549(B1) 申请公布日期 2001.08.21
申请号 US19980209761 申请日期 1998.12.11
申请人 AGFA-GEVAERT 发明人 DE KEYZER RENé;TREGUER MONA;BELLONI JACQUELINE;HYND REMITA
分类号 G03C1/015;G03C1/035;G03C1/08;G03C1/498;(IPC1-7):G03C1/035 主分类号 G03C1/015
代理机构 代理人
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