发明名称 Method for sequentially depositing a three-dimensional network
摘要 A method of producing radio frequency discharge plasma film layers having a three-dimensional functional film network. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three-dimensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks provides means for significantly increasing the surface functional density.
申请公布号 US6277449(B1) 申请公布日期 2001.08.21
申请号 US19990345248 申请日期 1999.06.30
申请人 KOLLURI OMPRAKASH S.;JOHANSON ROBERT G. 发明人 KOLLURI OMPRAKASH S.;JOHANSON ROBERT G.
分类号 H05H1/02;B05D1/36;B05D7/00;B05D7/24;C08F2/46;C08F2/48;C08F8/00;C08G83/00;C23C14/28;H05B6/00;H05B6/46;H05H1/24;(IPC1-7):C08J7/18 主分类号 H05H1/02
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