发明名称 METHOD AND DEVICE FOR SHIELDING SECONDARY X-RAY FROM ELECTRON BEAM IRRADIATING DEVICE FOR FINE LINE
摘要 PROBLEM TO BE SOLVED: To secure safe working environment without losing work efficiency by simply shielding secondary X-rays generated at the time of irradiating a coating material applied on fine lines with electron beams. SOLUTION: The method for shielding secondary X-rays emitted from the electron beam irradiating device for the fine line is characterized by shielding the secondary X-rays generated by electron beam irradiation by providing X-ray shielding tubes at an entrance and an exit of the fine line in the electron beam irradiating device for irradiating the coating material applied on the fine line with the electron beams to execute curing.
申请公布号 JP2001226149(A) 申请公布日期 2001.08.21
申请号 JP20000040438 申请日期 2000.02.18
申请人 SHIN ETSU CHEM CO LTD 发明人 OBA TOSHIO;KAWADA ATSUO;UENO MASAYA
分类号 C03C25/12;G02B6/44;G21K5/10;H01J37/09;(IPC1-7):C03C25/12 主分类号 C03C25/12
代理机构 代理人
主权项
地址