发明名称 SUBSTRATE TRANSFER APPARATUS
摘要 PURPOSE: A substrate transfer apparatus is provided to form a hermetically-closed space integrated between a normal substrate processing apparatus and a substrate transfer container and a substrate transfer method capable of transferring a substrate between the substrate transfer container and the substrate processing apparatus without contaminating the substrate by adsorption of gas molecules in the atmosphere. CONSTITUTION: The transfer apparatus is provided with a main body(11) in a box-like shape, an upper opening(12) and a sidewall opening(13) provided to the main body(11), a gas introducing pipe(14) and an exhaust pipe(15) connected to the main body(11), an opening/closing mechanism(16) installed at inside of the main body(11), a cassette elevator(17) and a transfer arm(18). The main body(11) is provided with a size for containing a cassette(S) holding a substrate(W). An inner wall of the main body(11) is constituted by a metal and a wall face thereof at a height position the same as that of the side wall opening(13) is constituted by a transparent material.
申请公布号 KR20010078006(A) 申请公布日期 2001.08.20
申请号 KR20010002895 申请日期 2001.01.18
申请人 SONY CORPORATION 发明人 SAGA KOICHIRO
分类号 B65G49/00;B65G49/06;B65G49/07;H01L21/00;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/00
代理机构 代理人
主权项
地址