发明名称 DEPOSITION OF GAMMA-Al2O3 BY CVD
摘要 PURPOSE: Provided is a method of forming a coated body having a layer of gamma-Al2O3, in which the body is coated with a gaseous mixture of AlCl3, CO2, H2 and H2S at a temperature of from about 600 to 800 deg.C. CONSTITUTION: The gamma-Al2O3 layer is deposited at a temperature of 700 to 900deg.C by using a gaseous mixture containing H2S in a quantity significantly higher than that of the conventional one.
申请公布号 KR20010078265(A) 申请公布日期 2001.08.20
申请号 KR20010004991 申请日期 2001.02.02
申请人 SECO TOOLS AB 发明人 RUPPI SAKARI
分类号 B23B27/14;B23P15/28;C23C16/06;C23C16/40;(IPC1-7):C23C16/06 主分类号 B23B27/14
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