发明名称 GAS LASER DEVICE
摘要 PURPOSE: To provide an excimer laser device capable of stable oscillation at a repetition frequency of at least 4 kHz as a high frequency which is not used in the conventional case. CONSTITUTION: This excimer laser device consists of a laser chamber (1) in which laser gas is sealed, a pair of main discharge electrodes (2) arranged in the chamber (1), and a cross flow fan (3) in the chamber (1) which makes the laser gas circulating stream flowing in at least a part between the main discharge electrodes (2). In the laser device whose repetition frequency is at least 4 kHz, the diameter of the cross flow fan (3) is at most 150 mm, and the peripheral velocity is at least 25.0 m/s.
申请公布号 KR20010077963(A) 申请公布日期 2001.08.20
申请号 KR20010000387 申请日期 2001.01.04
申请人 USHIO RESEARCH INSTITUTE OF TECHNOLOGY INC. 发明人 IGARASHI DATSUSHI
分类号 H01S3/03;H01S3/036;H01S3/225;(IPC1-7):H01S3/225 主分类号 H01S3/03
代理机构 代理人
主权项
地址