APPARATUS FOR MANUFACTURING SEMICONDUCTOR WAFER HAVING SURFACE TEMPERATURE DETECTION CAPACITY OF SEMICONDUCTOR WAFER

摘要

PURPOSE: An apparatus for manufacturing a semiconductor wafer having surface temperature detection capacity of the semiconductor wafer is provided to control an optimum state of a surface temperature of the semiconductor wafer and to minimize defects of the semiconductor wafer, by installing an insertion-type thermometer in a helium exhausting pipe to detect the temperature of helium gas. CONSTITUTION: A coolant supplying pipe(104) supplies coolant for cooling a semiconductor wafer(102) and maintaining a constant temperature of the semiconductor wafer to a back surface of the semiconductor wafer loaded to a wafer chuck(100). A coolant exhausting pipe(114) exhausts the coolant supplied to the back surface of the semiconductor wafer. A temperature detection unit detects the temperature of the coolant exhausted after the coolant is supplied to the back surface of the semiconductor wafer, installed in the coolant exhausting pipe.