发明名称 PROCEDE DE REALISATION D'UN FILM MINCE UTILISANT UNE MISE SOUS PRESSION
摘要 <p>The invention relates to a process for making a thin film starting from a substrate (1) of a solid material with a plane face (2) comprising:the implantation of gaseous compounds in the substrate (1) to make a layer of micro-cavities (4) at a depth from the said plane face (2) corresponding to the thickness of the required thin film, the gaseous compounds being implanted under conditions that could weaken the substrate at the layer of micro-cavities,partial or total separation of the thin film from the rest of the substrate (1), this separation comprising a step in which thermal energy is added and pressure is applied to the said plane face (2).</p>
申请公布号 FR2795865(B1) 申请公布日期 2001.08.17
申请号 FR19990008379 申请日期 1999.06.30
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 ASPAR BERNARD;BRUEL MICHEL;MORICEAU HUBERT
分类号 H01L27/12;H01L21/02;H01L21/20;H01L21/762;(IPC1-7):H01L21/265;H01L21/324 主分类号 H01L27/12
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