发明名称 LOWER ELECTRODE OF CAPACITOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a lower electrode of capacitor and its manufacturing method which can avoid short circuit between storage node electrodes, with increase of the effective surface area. SOLUTION: The lower electrode of a capacitor is constituted by forming impurity regions at specified regions on a semiconductor substrate 30, forming insulation layers 34, 35 through which contact openings 36 are bored to expose the impurity regions, forming storage node electrodes 50 composed of first and second regions 50a, 50b electrically connected to the impurity regions through the contact openings 36, forming HSGs 60 on the upsides of the storage node electrodes 50, forming an oxide film on the upsides of the HSGs 60, and etching the oxide film.
申请公布号 JP2001223343(A) 申请公布日期 2001.08.17
申请号 JP20010011553 申请日期 2001.01.19
申请人 HYNIX SEMICONDUCTOR INC 发明人 RYO SEIKAN
分类号 H01L21/8242;H01L21/02;H01L27/108 主分类号 H01L21/8242
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