PHOTORESIST STRIPER COMPOSITION

摘要

PURPOSE: Provided is a photoresist striper composition containing ethyl lactate and an organic solvent, which can remove photoresist effectively and fast from a substrate such as a silicon wafer. CONSTITUTION: The photoresist striper composition comprises the ethyl lactate(EL) and one organic solvent selected from the group consisting of n-butyl acetate(NBA), propylene glycol methyl ether acetate(PGMEA), and propylene glycol monomethyl ether(PGME) in the weight ratio of 1-9:9-1 or the EL and two organic solvent selected from the group consisting of the NBA, the PGMEA, and the PGME in the weight ratio of 1-8:1-8:1-8.