| 摘要 |
PROBLEM TO BE SOLVED: To provide a water-base photo soldering resist composition having no problem on storage stability, excellent in heat resistance and emitting no solvent odor. SOLUTION: The water-base photo soldering resist composition contains (A) an aqueous solution obtained by neutralizing a resin containing a radical polymerizable group and a carboxyl group with a base, (B) an inorganic filler, (C) a photo-curable composition comprising a polyfunctional acrylic monomer (c1), a compound (c2) having a cyclic ether group other than a glycidyl group and a photopolymerization initiator (c3) and, optionally, (D) an aqueous solution obtained by neutralizing a radical polymer having 130-230 mgKOH/g acid value with a base. The cyclic ether group may be an alicyclic epoxy group or an oxetane group. |
