| 摘要 |
PROBLEM TO BE SOLVED: To provide substrate washing technique that does not require any circulation of washing liquid, improves washing effect even with a small amount of chemical and achieves treatment at a room temperature, and hence can miniaturize a device, save energy, and reduce costs. SOLUTION: The method for washing a substrate using functional water as washing water consists of a process for dipping a wafer W in the washing water that is accommodated in treatment baths 1A and 1B, a process for supplying the washing water into the treatment baths 1A and 1B for overflowing, and a process for immediately draining the overflowed washing water without using any circulation.
|
