发明名称 LITHOGRAPHY PROJECTION ALIGNER AND METHOD OF FABRICATING DEVICE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an apparatus comprising means for avoiding collision of tables even for unexpected situation such as control software error or power supply failure, on the occasion of exchanging tables in different work areas in the lithography projection aligner including a plurality of tables for placing mask or substrate. SOLUTION: This collision preventing preventing means provides the substrate tables WTa, WTb to the work areas 30 from 20 or provides, on the contrary, physical obstacles 190, 170, 180 just like a maze along the moving route, disabling the moving on the route other than the adequate routes. During this exchange, each table is coupled respectively with shuttles CS1, CS2, these shuttles are couples with a chain or the like, thereby moving these shuttles only when these are synchronized to avoid the collision thereof.
申请公布号 JP2001223159(A) 申请公布日期 2001.08.17
申请号 JP20000385644 申请日期 2000.12.19
申请人 ASM LITHOGRAPHY BV 发明人 KWAN YIM BUN PATRICK;VAN DE PASCH ENGELBERTUS A F;ARIENS ANDREAS BERNARDUS GERARDUS;MUNNIG SCHMID ROBERT-HAN;HOOGKAMP JAN F;BUIS EDWIN JOHAN
分类号 G03F7/22;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/22
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