发明名称 METHOD FOR AUTOMATICALLY MANAGING VARIATION OF SEMICONDUCTOR PROCESS
摘要 PURPOSE: A method for automatically managing variation is provided to detect variation of a trend and to inform an engineer in charge of the variation, by continuously collecting critical dimension(CD) value, a direct current(DC) value, unit process equipment information, variation of a process parameter and a run history. CONSTITUTION: Lot information of a plurality of manufacturing steps is collected from databases. A critical dimension(CD) value, a direct current(DC) value, a process equipment information, a process parameter and a lot history of the lot are collected. Short-term and long-term running mean value of a trend are generated by using the collected CD and DC values and previous CD and DC values. Whether an abnormal state is generated, is inspected by using the short-term and long-term running mean value. If the abnormal state is generated, an equipment item and a process parameter item of a corresponding process step and a relation process step are obtained according to a process relation database. Data prior to an interval from when the abnormal state starts to when predetermined time lapses is obtained from the database according to the equipment information and process parameter item of the relation process. Similarity of the process equipment information and the process parameter with the lots corresponding to the step in which the abnormal stage is generated, is inspected. If the similarity is generated, an abnormal state process, an abnormal state origin process, abnormal state origin process equipment and the process parameter are noticed to a relative department written in the relative database.
申请公布号 KR20010077389(A) 申请公布日期 2001.08.17
申请号 KR20000005162 申请日期 2000.02.02
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAE, GEON YEONG
分类号 H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/00
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