WET ETCHING APPARATUS AND WET ETCHING METHOD USING THE SAME

摘要

PURPOSE: A wet etching apparatus is provided to stabilize the state of etching liquid diluted in an etching bath and to eliminate etching ununiformity according to a region of an etching target, by separately installing a mixing unit for compensating for density variation of the diluted etching liquid in the outside of an etching tank composed of the etching bath and an external bath. CONSTITUTION: A circulation line(G1,G2) is used for circulating etching liquid from one end of an etching bath(42) to the other end of the etching bath. A pump(P) is installed in the circulation line. A heater(H) is installed in the circulation line. A mixing unit(48) is used for diluting the etching liquid, installed in the circulation line.