发明名称 |
CERAMIC SUBSTRATE FOR SEMICONDUCTOR PRODUCTION/INSPECTION DEVICE |
摘要 |
A ceramic substrate capable of ensuring a sufficiently large withstand voltage despite a larger-than-ever maximum pore size of up to 50 mu ñm, increasing a fracture toughness by the presence of pores, surviving a thermal shock, and being reduced in camber at high temperatures, comprising a conductor formed on the surface of or inside the ceramic substrate, characterized in that the ceramic substrate consists of non-oxide ceramics containing oxygen and has a maximum pore size of up to 50 mu ñm. |
申请公布号 |
WO0158828(A1) |
申请公布日期 |
2001.08.16 |
申请号 |
WO2001JP00866 |
申请日期 |
2001.02.07 |
申请人 |
IBIDEN CO., LTD.;HIRAMATSU, YASUJI;ITO, YASUTAKA |
发明人 |
HIRAMATSU, YASUJI;ITO, YASUTAKA |
分类号 |
H01L21/68;H01L23/498;(IPC1-7):C04B35/56;H01L21/02;C04B35/58 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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