发明名称 CERAMIC SUBSTRATE FOR SEMICONDUCTOR PRODUCTION/INSPECTION DEVICE
摘要 A ceramic substrate capable of ensuring a sufficiently large withstand voltage despite a larger-than-ever maximum pore size of up to 50 mu ñm, increasing a fracture toughness by the presence of pores, surviving a thermal shock, and being reduced in camber at high temperatures, comprising a conductor formed on the surface of or inside the ceramic substrate, characterized in that the ceramic substrate consists of non-oxide ceramics containing oxygen and has a maximum pore size of up to 50 mu ñm.
申请公布号 WO0158828(A1) 申请公布日期 2001.08.16
申请号 WO2001JP00866 申请日期 2001.02.07
申请人 IBIDEN CO., LTD.;HIRAMATSU, YASUJI;ITO, YASUTAKA 发明人 HIRAMATSU, YASUJI;ITO, YASUTAKA
分类号 H01L21/68;H01L23/498;(IPC1-7):C04B35/56;H01L21/02;C04B35/58 主分类号 H01L21/68
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