发明名称 Amorphous dielectric capacitors on silicon
摘要 High-capacity capacitors and gate insulators exhibiting moderately high dielectric constants with surprisingly low leakage using amorphous or low temperature films of perovskite type oxides including a titanate system material such as barium titanate, strontium titanate, barium strontium titanate (BST), lead titanate, lead zirconate titanate, lead lanthanum zirconate titanate, barium lanthanum titanate, a niobate, aluminate or tantalate system material such as lead magnesium niobate, lithium niobate lithium tantalate, potassium niobate and potassium tantalum niobate, a tungsten-bronze system material such as barium strontium niobate, lead barium niobate, barium titanium niobate, and Bi-layered perovskite system material such as strontium bismuth tantalate, bismuth titanate deposited directly on a silicon surface at temperatures about 450° C. or less.
申请公布号 US2001014505(A1) 申请公布日期 2001.08.16
申请号 US20010841948 申请日期 2001.04.25
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DUNCOMBE PETER RICHARD;LAIBOWITZ ROBERT BENJAMIN;NEUMAYER DEBORAH ANN;SHAW THOMAS MCCARROLL
分类号 H01L27/108;H01L21/02;(IPC1-7):H01L21/336 主分类号 H01L27/108
代理机构 代理人
主权项
地址