发明名称 |
Object positioning method for a lithographic projection apparatus |
摘要 |
A method for placement of a object such as a substrate or a mask on a table, said method including: a first placement step in which the object is placed on a first position on the table; a measuring step in which a displacement between the first position of the object and the required position of the object is determined; a removing step in which the object is released and removed from the table; a moving step in which the object and the table are moved relatively to each other by substantially the said displacement, in a direction substantially parallel to the surface of the table; and a second placement step in which the object is placed at the required position on the table.
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申请公布号 |
US2001014170(A1) |
申请公布日期 |
2001.08.16 |
申请号 |
US20010777460 |
申请日期 |
2001.02.08 |
申请人 |
WILLEMS VAN DIJK MARCUS J.H.;VAN DE PASCH ENGELBERTUS A.F.;CASTENMILLER THOMAS J.M.;ARIENS ANDREAS B.G. |
发明人 |
WILLEMS VAN DIJK MARCUS J.H.;VAN DE PASCH ENGELBERTUS A.F.;CASTENMILLER THOMAS J.M.;ARIENS ANDREAS B.G. |
分类号 |
G03F7/22;G03F7/20;G03F9/00;H01L21/027;H01L21/68;(IPC1-7):G06K9/00;G06K9/32 |
主分类号 |
G03F7/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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