发明名称 APPARATUS FOR SUPPLYING PHOTOSENSITIVE SOLUTION FOR SEMICONDUCTOR MANUFACTURE
摘要 PURPOSE: An apparatus for supplying a photosensitive solution for a semiconductor manufacture is provided to all use a non-used photosensitive solution inside of a photosensitive solution vessel. CONSTITUTION: The apparatus includes first and second photosensitive solution vessels(100a,100b), a pump controlling portion, a support, a vessel moving unit and a photosensitive filling unit(120). A supplying tube connected to a rotation coat apparatus is formed to the first and second photosensitive solution vessels in which a photosensitive solution is filled. The pump controlling portion is installed to the supplying tube so that an interlock operation is performed and sequentially pumps the photosensitive solution of the first and second photosensitive solution vessels to the rotation coat apparatus. The support supports the first and second photosensitive solution vessels, respectively. The vessel moving unit changes the height of the first and second photosensitive solution vessels by moving the support in the upper or lower side. The photosensitive filling unit makes so that a residual photosensitive solution of the first or the second photosensitive solution vessel, which is left after being removed in the upper side by the vessel moving unit and being supplied to the rotation coat apparatus, is filled into the first or second photosensitive solution vessel which is moved in the lower side by water pressure.
申请公布号 KR20010076833(A) 申请公布日期 2001.08.16
申请号 KR20000004238 申请日期 2000.01.28
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KWON, GI YONG
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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