发明名称 |
PHOTOCURABLE/THERMOSETTING COMPOSITION FOR FORMING MATTE FILM |
摘要 |
<p>A photocurable/thermosetting composition which is useful for forming a matte film and is developable with an aqueous alkali solution. The composition comprises (A) a photosensitive prepolymer obtained by reacting an (un)saturated polybasic acid anhydride with hydroxyl groups of an ester of a novolak epoxy compound with an unsaturated monocarboxylic acid, (B) a carboxylated copolymer resin, (C) a photopolymerization initiator, (D) a diluent, and (E) a polyfunctional epoxy compound having at least two epoxy groups per molecule and optionally contains (F) an inorganic filler. The composition can further contain (G) a hardener for epoxy resins. This composition is suitable for use in forming a solder resist for printed circuit boards.</p> |
申请公布号 |
WO0158977(A1) |
申请公布日期 |
2001.08.16 |
申请号 |
WO2000JP00795 |
申请日期 |
2000.02.14 |
申请人 |
TAIYO INK MANUFACTURING CO., LTD.;IWAIDA, SATORU;OHNO, YOSHIHIRO;ISONO, MASAYUKI;SEKIMOTO, AKIO |
发明人 |
IWAIDA, SATORU;OHNO, YOSHIHIRO;ISONO, MASAYUKI;SEKIMOTO, AKIO |
分类号 |
C08F2/46;C08G59/14;C08G59/42;C09D4/00;C09D5/00;C09D11/00;C09D133/02;C09D157/10;C09D163/00;G03F7/027;G03F7/032;G03F7/038;H05K3/28;(IPC1-7):C08G59/42 |
主分类号 |
C08F2/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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