ION IMPLANTING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: An ion implanting apparatus for manufacturing a semiconductor device is provided to reduce process time, prevent a wafer from being scratched and efficiently identify a lot ID of a wafer. CONSTITUTION: The ion implanting apparatus performs an ion implanting process for loaded wafers and then aligns the wafers in desired direction by using a flat zone aligner to unload. Only one wafer of the loaded wafers is aligned in the direction to want.