发明名称 BIPOLAR TRANSISTOR WITH TRENCHED-GROOVE ISOLATION REGIONS
摘要 The invention relates to semiconductor devices having a bipolar transistor to form an isolation area within a base electrode contact area to ensure stable contact of the base electrode. The bipolar transistor formed in the transistor area is in the form of an island and is rectangular when view from above. The isolation area is formed of a dielectric material around the transistor area, and the base area is formed around the emitter area which forms the central area of the transistor area. A contact groove is formed at the inner interface of the isolation groove which faces the outer surface of the transistor area, and a part of the base electrode is buried in the contact groove and faces at least one of the upper surface of the transistor area and an inner surface of the contact groove.
申请公布号 US2001013635(A1) 申请公布日期 2001.08.16
申请号 US19980045794 申请日期 1998.03.23
申请人 KITAHATA HIDEKI 发明人 KITAHATA HIDEKI
分类号 H01L29/73;H01L21/331;H01L21/76;H01L21/762;H01L27/082;H01L29/732;(IPC1-7):H01L27/082;H01L27/102 主分类号 H01L29/73
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