发明名称 |
Double pass double etalon spectrometer |
摘要 |
A first double pass etalon based spectrometer. In a preferred embodiment a second etalon matched to the first double pass etalon is used to produce extremely precise fringe data. Spectral components of a diffused beam are angularly separated as they are transmitted through an etalon. A retroreflector reflects the transmitted components back through the etalon. Twice transmitted spectral components are directed through a second etalon and focused onto a light detector which in a preferred embodiment is a photo diode array. The spectrometer is very compact producing the extremely precise fringe data permitting bandwidth measurements with precision needed for microlithography for both DELTAlambdFWHM and DELTAlambd95%.
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申请公布号 |
US2001013933(A1) |
申请公布日期 |
2001.08.16 |
申请号 |
US20000737181 |
申请日期 |
2000.12.14 |
申请人 |
SMITH SCOTT T.;ERSHOV ALEXANDER I.;BUCK JESSE D. |
发明人 |
SMITH SCOTT T.;ERSHOV ALEXANDER I.;BUCK JESSE D. |
分类号 |
G01B9/02;G01J3/26;G01J3/36;(IPC1-7):G01B9/02 |
主分类号 |
G01B9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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