| 摘要 |
<p>A beam characterization monitoring apparatus receives an input VUV beam and measures a beam profile characteristic of the beam. An enclosure has an interior substantially free of VUV photoabsorbing species and configured for receiving the input VUV beam therein. Optics within the enclosure separate the input VUV beam into a first component for measuring a near field beam profile characteristic and a second component for measuring a far field beam profile characteristic. A detector coupled with the enclosure via a beam path substantially free of VUV photoabsorbing species preferably detects the first and second components simultaneously. A quantum converter is preferably disposed along the beam path before the detector for converting the VUV beam to a beam having a wavelength above 240 nm. A second detector preferably detects an energy of an additional component of the input VUV beam.</p> |
