发明名称 |
Electron beam apparatus and image forming apparatus |
摘要 |
An electron beam apparatus includes an electron source having an electron-emitting device, an electrode for controlling an electron beam emitted from the electron source, a target to be irradiated with an electron beam emitted from the electron source and a spacer arranged between the electron source and the electrode. The spacer has a semiconductor film on the surface thereof that is electrically connected to the electron source and the electrode.
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申请公布号 |
US6274972(B1) |
申请公布日期 |
2001.08.14 |
申请号 |
US19980045681 |
申请日期 |
1998.03.23 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MITSUTAKE HIDEAKI;KAWATE SHINICHI;NAKAMURA NAOTO;SANO YOSHIHISA |
分类号 |
H01J5/03;H01J9/18;H01J9/24;H01J29/02;H01J29/86;H01J29/87;H01J31/12;(IPC1-7):H01J19/42 |
主分类号 |
H01J5/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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