发明名称 ORIGINAL FILM FOR LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To provide an original film for lithography of a heat mode type which has high sensitivity and a wide exposure latitude without necessitating development, and can be made into a plate simply and also with direct fitting on a printing machine and, besides, which is excellent in plate wear and causes little printing stain on a printing surface. SOLUTION: In this original film for lithography, a hydrophobic layer or a metal thin-film layer containing a photothermal conversion agent is provided as a first layer on a support. Further, a hydrophilic layer containing metal particulates having photothermal conversion properties which scatter and remove layer-forming substances or embrittle them removably as light is converted into heat is provided as a second layer.
申请公布号 JP2001219664(A) 申请公布日期 2001.08.14
申请号 JP20000030682 申请日期 2000.02.08
申请人 FUJI PHOTO FILM CO LTD 发明人 HOSHI SATOSHI;WAKI KOKICHI;OGAWA KEIZO;ISHIMARU SHINGO
分类号 G03F7/004;B41N1/14;G03F7/00;G03F7/11;G03F7/36 主分类号 G03F7/004
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