发明名称 |
Method of strain engineering and impurity control in III-V nitride semiconductor films and optoelectronic devices |
摘要 |
In the present invention, an interfacial layer is added to a light-emitting diode or laser diode structure to perform the role of strain engineering and impurity gettering. A layer of GaN or AlxInyGa1-x-yN (0<=x<=1, 0<=y<=1) doped with Mg, Zn, Cd can be used for this layer. Alternatively, when using AlxInyGa1-x-yN (x>0), the layer may be undoped. The interfacial layer is deposited directly on top of the buffer layer prior to the growth of the n-type (GaN:Si) layer and the remainder of the device structure. The thickness of the interface layer varies from 0.01-10.0 mum.
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申请公布号 |
US6274399(B1) |
申请公布日期 |
2001.08.14 |
申请号 |
US20000655752 |
申请日期 |
2000.09.06 |
申请人 |
LUMILEDS LIGHTING, U.S. LLC |
发明人 |
KERN R. SCOTT;CHEN CHANGHUA;GOETZ WERNER;KUO CHIHPING |
分类号 |
H01L21/20;H01L33/32;H01S5/30;H01S5/32;H01S5/323;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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