发明名称 METHOD AND DEVICE FOR CLEANING HARMFUL GAS
摘要 PROBLEM TO BE SOLVED: To provide a method and device capable of cleaning harmful components in the harmful gas discharged from a reaction process using an organometallic compound as a reaction raw material and unnexessitating a post treatment without discharging any organic compound and a large amount of carbon dioxide after cleaning process. SOLUTION: The harmful gas is cleaned by brining the harmful gas into contact with the catalyst at 100-800 deg.C by using a cleaning device provided with a harmful gas introducing pipe, an oxygen or air introducing pipe, a cleaning cylinder which is connected to two introducing pipes and in which a catalyst carrying noble metal on an inorganic carrier and a catalyst carrying a catalyst consisting of metal oxides such as vanadium oxide, chromium oxide, manganese oxide, iron oxide, copper oxide and silver oxide or a catalyst carrying these metal oxides are packed, a means for heating the cleaning cylinder and a discharge pipe for the cleaned gas discharged from the cleaning cylinder.
申请公布号 JP2001219033(A) 申请公布日期 2001.08.14
申请号 JP20000350510 申请日期 2000.11.17
申请人 JAPAN PIONICS CO LTD 发明人 OTSUKA KENJI;MURANAGA NAOKI;ARAKAWA CHITSU;IKEDA TOMOHISA
分类号 B01D53/86 主分类号 B01D53/86
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