| 摘要 |
PURPOSE: A wafer holder for a chemical-mechanical planarization apparatus is provided to prevent a movement of a wafer within a wafer holder when a polishing process is performed. CONSTITUTION: A retainer(10) of a wafer holder has three parts(10-1,10-2,10-3). Three parts(10-1,10-2,10-3) of the retainer(10) are combined to each other. A wafer(12) is held by the retainer(10) when three parts of the retainer(10) is combined to each other. Each inner face of three parts(10-1,10-2,10-3) of the retainer(10) is identical with a side face of the wafer(12) since the wafer(12) is located in an opening(14). Accordingly, the opening(14) has a circular shape since the wafer(12) has the circular shape. Three parts(10-1,10-2,10-3) of the retainer(10) are operated by an actuator. The actuator is installed on the wafer holder. |
