发明名称 Electroplating apparatus
摘要 An apparatus for electroplating at least one substrate is disclosed as including a trough, two anodes, at least one bath and two poly-tetrafluoroethylene sheets or a number of substantially rigid polypropylene plates, in which the trough supports the substrate and is in an electrically conductive relationship therewith, and the bath contains the anodes, the trough and an electrolyte, in which, in operation, an electric field exists in the electrolyte between the trough and the anodes, and in which the poly-tetrafluoroethylene sheets or the polypropylene plates are movable to vary the amount of electric current passing between the trough and the anodes.
申请公布号 US6274010(B1) 申请公布日期 2001.08.14
申请号 US19980114122 申请日期 1998.07.13
申请人 PROCESS AUTOMATION INTERNATIONAL LIMITED 发明人 HENINGTON PAUL;FUNG CHUN PAN;LI KWOK WAH;LEE CHI CHUNG
分类号 C25D17/00;C25D17/06;H05K3/24;(IPC1-7):C25B15/00 主分类号 C25D17/00
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