发明名称 Comparator for determining process variations
摘要 A comparison circuit may be fabricated along with a primary circuit on a semiconductor substrate. The propagation delay of a comparison signal across a first path of circuit elements is compared to propagation delays of the comparison signal across a second path of delay elements. As a semiconductor fabrication process varies, the relative propagation delays across the first and second paths will vary in a manner correlative to the process variations. By monitoring the relative propagation delays, the fabrication process may be controlled to ensure that the process does not vary to an undesirable extent. Also, various programmable delay elements may be fabricated into the primary circuit, and these programmable delay elements may be activated and/or deactivated in response to the relative propagation delays of the comparison circuit.
申请公布号 US6275085(B1) 申请公布日期 2001.08.14
申请号 US19990317387 申请日期 1999.05.24
申请人 MICRON TECHNOLOGY, INC. 发明人 MULLARKEY PATRICK J.
分类号 H03K5/159;H03K5/26;H03K19/003;(IPC1-7):H03H11/26 主分类号 H03K5/159
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