发明名称 Method and apparatus for baking out a gate valve in a semiconductor processing system
摘要 A device for achieving vacuum conditions more quickly in a semiconductor processing system having a vacuum pump, a gate valve and a chamber includes a rigid body containing heating elements that contact the surface of the gate valve. The device may include a U-shaped retainer clip for holding the device to the gate valve. A method for heating a gate valve to drive off contaminants involves heating the lower portion of the gate valve to drive contaminants towards the vacuum pump.
申请公布号 US6274854(B1) 申请公布日期 2001.08.14
申请号 US19990371804 申请日期 1999.08.10
申请人 APPLIED MATERIALS, INC. 发明人 FRANKLIN TIMOTHY JOSEPH;HUO DAVID DATONG
分类号 F16K3/00;F04B37/08;F04B37/16;F16K49/00;F16K51/02;H01L21/203;(IPC1-7):H05B3/02 主分类号 F16K3/00
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