| 摘要 |
PURPOSE: A developing treatment equipment is provided to prevent dropping of developer from a coating liquid supply nozzle on a substrate on which the developer has been already supplied. CONSTITUTION: A developer supply nozzle(70) which is installed so as to move freely in the X direction in a chamber(60) begins to move from a cleaning tank(85) as a waiting position(T) to the positive X direction. The nozzle(70) crosses a part above a wafer(W) without supplying developer and stops at a position(P') which proceeds a little from an end portion(P) of the wafer(W). The nozzle(70) then moves in the reverse direction, i.e., the negative X direction while supplying developer to the wafer(W). After that, the nozzle(70) stops supply of developer at a position(Q') which proceeds a little from an end portion(Q) of a cleaning tank(85) side of the wafer(W), and is returned to the cleaning tank(85).
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