发明名称 WAFER HOLDER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PURPOSE: A wafer holder for a semiconductor manufacturing apparatus is provided to include a conductive layer and a pair of ceramic base members sandwiching the conductive layer therebetween, wherein the conductive layer has a body facing a wafer holding surface of the member of ceramic and an extraction extracted from the body for external connection and the body and the extraction are arranged substantially in a single plane. CONSTITUTION: The semiconductor manufacturing apparatus includes a vacuum chamber(50) having provided therein a wafer holder(10), a top electrode(30) for generating a plasma, and a gas shower unit(40). Wafer holder(10) is used to hold a wafer(20) and mainly has a heater(1) for heating wafer(20), a bottom electrode(2) for generating a plasma, and an electrode(3) for an electrostatic chuck for holding wafer(20).
申请公布号 KR20010076379(A) 申请公布日期 2001.08.11
申请号 KR20010003125 申请日期 2001.01.19
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 KUIBIRA AKIRA;NAKATA HIROHIKO
分类号 H01L21/302;H01L21/00;H01L21/205;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 H01L21/302
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