发明名称 |
WAFER HOLDER FOR SEMICONDUCTOR MANUFACTURING APPARATUS |
摘要 |
PURPOSE: A wafer holder for a semiconductor manufacturing apparatus is provided to include a conductive layer and a pair of ceramic base members sandwiching the conductive layer therebetween, wherein the conductive layer has a body facing a wafer holding surface of the member of ceramic and an extraction extracted from the body for external connection and the body and the extraction are arranged substantially in a single plane. CONSTITUTION: The semiconductor manufacturing apparatus includes a vacuum chamber(50) having provided therein a wafer holder(10), a top electrode(30) for generating a plasma, and a gas shower unit(40). Wafer holder(10) is used to hold a wafer(20) and mainly has a heater(1) for heating wafer(20), a bottom electrode(2) for generating a plasma, and an electrode(3) for an electrostatic chuck for holding wafer(20).
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申请公布号 |
KR20010076379(A) |
申请公布日期 |
2001.08.11 |
申请号 |
KR20010003125 |
申请日期 |
2001.01.19 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
KUIBIRA AKIRA;NAKATA HIROHIKO |
分类号 |
H01L21/302;H01L21/00;H01L21/205;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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