| 摘要 |
PURPOSE: A water development photoresist composition is provided to improve environmental friendship property of the composition, to conveniently use in PCB industry and to reduce amount of wastewater caused from the development solution by utilizing water instead of weak alkali water solution as the development solution. CONSTITUTION: The water development photoresist composition comprises photo polymerizing multi-functional monomer, initiator and polymer binding agent. The binding agent is prepared by copolymerizing the salt of the formula I and the compound of the formula II (wherein R1 and R2 are H or CH3 and R3 is alkyl group having 1-6 carbon atoms). The salt is contained in the photoresist composition in an amount of 10-50 wt.% based on solid content of total polymer binding agent. The salt of formula I is formed by the following acid-base reaction scheme 1 (wherein R1 is H or C) The polymer binding agent has preferably a weight mean molecular weight of 30,000-250,000. |
