FLEXIBLY SUSPENDED GAS DISTRIBUTION MANIFOLD FOR PLASMA CHAMBER

摘要

PURPOSE: A flexibly suspended gas distribution manifold for a plasma chamber is provided to prevent distortion or cracking of the gas distribution plate in response to such thermal expansion or contraction. CONSTITUTION: The flexibly suspended gas distribution manifold having a gas inlet manifold(20-32) is suitable for performing plasma-assisted processes such as chemical vapor deposition(CVD) or etching on a large substrate. The plasma chamber or vacuum chamber has a housing or wall(10), preferably composed of aluminum, that encircles the interior of the chamber. The chamber includes a gas inlet manifold or plenum(20-32) that encloses a region referred to as the manifold interior. A gas line or conduit extending from the external gas supply to a gas inlet aperture or orifice(30) in an outer wall or back wall(28) of the gas inlet manifold supplies the process gases into the manifold interior. The gases then flow out of the manifold through hundreds or thousands of orifices(22) in a gas distribution plate or diffuser plate(20) so as to enter the region of the chamber interior between the gas distribution plate and the susceptor(12).