| 摘要 |
PURPOSE: To provide an exposure device which is manufactured with good yield by preventing a foreign matter from being held between a material 15 to be exposed and photomasks 11 and 12. CONSTITUTION: A pair of the photomasks 11 and 12 at which an exposure pattern is formed is attached and detached through the material 15 to be exposed by attaching and detaching means 13 and 14. The material 15 to be exposed is exposed in the state that the pair of the photomasks 11 and 12 are attached and detached by an exposure means. Purified gas is supplied between at least the pair of the photomasks 11 and 12 by a purified gas supply means 31. The purified gas is supplied between the pair of the photomasks 11 and 12, so that the foreign matter is prevented from being stuck to the material 15 to be exposed and the photomasks 11 and 12 during an exposure process and also the foreign matter stuck to the material 15 to be exposed is removed.
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