发明名称 METHOD AND DEVICE FOR PROCESSING PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a processing method and device for a photosensitive material, which is capable of stirring a processing liquid applied on the surface of the photosensitive material without necessitating a large tank for the processing liquid. SOLUTION: The processing liquid is applied directly onto/,the surface of a web of the photosensitive material by a movable coating device. The processing liquid on the photosensitive material is well stirred by relatively moving the web and the coating device. The movable coating device is moved to be or not to be in contact with the photosensitive material as needed to change the processing.
申请公布号 JP2001215683(A) 申请公布日期 2001.08.10
申请号 JP20000385361 申请日期 2000.12.19
申请人 EASTMAN KODAK CO 发明人 TWIST PETER J;EARLE ANTHONY
分类号 B05C1/02;B05D1/28;B05D7/00;G03C5/26;G03D5/06;G03D13/00;(IPC1-7):G03D5/06 主分类号 B05C1/02
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