POSITIVE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive photoresist composition having satisfactory sensitively and resolving power in the formation of a contact hole pattern in the production of a semiconductor device and generating few particles in a resist solution. SOLUTION: The positive photoresist composition contains (A) an acid generating sulfonium salt compound represented by a specified structure and (B) an acid decomposable siloxane having repeating units of a specified structure.