| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a probe for inspecting wefer having narrow pitch multiple pin electrodes 3 for inspecting with low cost and good contact property, where the probe is hitherto needed for high precision photoresist processing technique, because contact terminals are preparable to be formed by one etching process, for this purpose the photoresist mask for forming the contact terminals and fine lead-out wire forming parts are needed to be positioned with high precision for etching process. SOLUTION: In this manufacturing method, surface layers of conductive wires excluding mask-forming parts are etched by using a mask intersecting the conductive wires to form projections (contact terminals) and lead-out wires.
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