| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive polymer, a resist composition containing the polymer and a method for producing the polymer. SOLUTION: The photosensitive polymer is represented by formula I (where R1 is an acid decomposable tertiary alkyl; R2 is γ-butyrolacton-1, γ- butyrolacton-3-yl, mevalonic lactone, 3-tetrahydrofuranyl, 2, 3-propylene carbonate-1-yl or 3-methyl-γ-butyrolacton-3-yl; R3 is H, methyl, ethyl or a 3-20C alicyclic hydrocarbon compound; p/(p+q+r)=0.1 to 0.8; q/(p+q+r)=0.2 to 0.8; and r/(p+q+r)=0.0 to 0.4). |
