发明名称 COSMETIC COMPOSITION USED FOR SKIN LOTION
摘要 PURPOSE: A cosmetic composition used for a skin lotion is provided, thereby preventing the rough skin and improving moisture retainment on the skin. CONSTITUTION: The cosmetic composition used for a skin lotion comprises 5 to 7 wt.% of propyleneglycol; 1.0 to 1.5 wt.% of a moisture retaining agent selected from the group consisting of hyaluronic acid, phospholipid, glycoceramide or the combination thereof; and 0.2 to 0.4 wt.% of anti-inflammatory agent selected from Glycyrrizae Radix extract and alpha-bisabolol. The cosmetic composition may further comprise 5.0 to 7.0 wt.% of glycol, 0.2 to 0.4 wt.% of anti-inflammatory agent, 10 to 20 wt.% of ethanol, and 1.0 to 1.5 wt.% of moisture retaining agent. The process for producing the cosmetic composition comprises the steps of: dissolving phospholipid and glycoceramide by heating to 75 deg.C; dissolving glycols and hyaluronic acid by heating to 75 deg.C; mixing the above dissolutions at 75 deg.C and 3500 rpm; agitating the mixture at 1500 rpm and cooling to 40 deg.C; adding Glycyrrizae Radix extract, alpha-bisabolol and ethanol into the mixture and agitating it at 2000 rpm for 20 minutes; and filtrating and maturing it.
申请公布号 KR100306501(B1) 申请公布日期 2001.08.10
申请号 KR19930028679 申请日期 1993.12.20
申请人 CHEIL JEDANG CORPORATION 发明人 BANG, YEONG BAE;LEE, HUN;SUNG, GYEONG WON
分类号 (IPC1-7):A61K7/40 主分类号 (IPC1-7):A61K7/40
代理机构 代理人
主权项
地址