发明名称 STATIC INDUCTION BEAM LOCATION DETECTING DEVICE AND METHOD OF ADJUSTMENT OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a static induction beam location detecting device which enables to easily perform fine adjustment of the capacitance of the electrode. SOLUTION: A pair of electrodes provided inside a duct in which charged particles pass, an earth electrically insulated from, an arranged opposite to, the electrodes, and a voltage detecting means for detecting a voltage generated at each of the pair of the electrodes in accordance with passing position of the charge particles constitute the static induction beam location detecting device, which is further provided with a metal piece arranged in the beam axis direction against the electrodes and with a specified gap from them.
申请公布号 JP2001217098(A) 申请公布日期 2001.08.10
申请号 JP20000026229 申请日期 2000.02.03
申请人 MITSUBISHI ELECTRIC CORP 发明人 MARUYAMA AKIHIKO
分类号 H05H7/00;G01T1/29;H05H13/04;(IPC1-7):H05H7/00 主分类号 H05H7/00
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