发明名称 |
DEVELOPING SOLUTION FOR RADIATION SENSITIVE COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a developing solution for a radiation sensitive composition capable of satisfactorily developing a coating film formed from the radiation sensitive composition. SOLUTION: The developing solution contains (A) an alkali metallic carbonate, (B) an alkali metallic hydrogencarbonate and a nonionic surfactant of formula I (where R1 is H or methyl and (n) is 4-20). |
申请公布号 |
JP2001215733(A) |
申请公布日期 |
2001.08.10 |
申请号 |
JP20000026033 |
申请日期 |
2000.02.03 |
申请人 |
ASAHI DENKA KOGYO KK |
发明人 |
IWAKURA SHUJI;KAWAHARA MAKI |
分类号 |
H01L21/027;G03F7/32;G03F7/42;(IPC1-7):G03F7/32 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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