发明名称 DEVELOPING SOLUTION FOR RADIATION SENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a developing solution for a radiation sensitive composition capable of satisfactorily developing a coating film formed from the radiation sensitive composition. SOLUTION: The developing solution contains (A) an alkali metallic carbonate, (B) an alkali metallic hydrogencarbonate and a nonionic surfactant of formula I (where R1 is H or methyl and (n) is 4-20).
申请公布号 JP2001215733(A) 申请公布日期 2001.08.10
申请号 JP20000026033 申请日期 2000.02.03
申请人 ASAHI DENKA KOGYO KK 发明人 IWAKURA SHUJI;KAWAHARA MAKI
分类号 H01L21/027;G03F7/32;G03F7/42;(IPC1-7):G03F7/32 主分类号 H01L21/027
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