发明名称 EXPOSURE DEVICE AND METHOD OF COLOR CRT USING ELECTRON BEAM
摘要 PURPOSE: An exposure device and a method of a color CRT using an electron beam are provided to accurately and easily perform a B, M exposure process and an R, G, B exposure process using a deflected electron beam. CONSTITUTION: A panel(6) coated with a fluorescent layer(22) and having a shadow mask(14) mounted is coupled to an exposure device consisting of an electron gun(18), a deflecting yoke(74), a vacuum chamber(4), a vacuum unit, a controller(22), a deflecting circuit and a high voltage circuit. At this state, vacuum degree of 1/1000-1/100000 torr is maintained to form same environment and vacuum degree as those for a finished color CRT. Then, an deflected electron beam is irradiated to the fluorescent layer and shadow mask of the panel to perform a B, M exposure process and a G, B, R exposure process.
申请公布号 KR100306495(B1) 申请公布日期 2001.08.10
申请号 KR19980053337 申请日期 1998.12.04
申请人 SEHYANG INDUSTRIAL CO., LTD. 发明人 HA, JAE HO
分类号 H01J9/20;(IPC1-7):H01J9/20 主分类号 H01J9/20
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