METHOD FOR EVALUATING SUBSTRATE UNEVEN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method capable of evaluating diffusibility or directionality as a deflecting plate even in a stage of a substrate uneven film in a process for manufacturing the diffusing and reflecting plate for a liquid crystal display apparatus. SOLUTION: A standard measuring film substrate 22 is preliminarily formed by forming a smooth standard measuring film 3 having the same material and thickness as the reflecting film to be formed on the upper surface of the substrate uneven film. A substrate uneven film substrate 21 wherein the substrate uneven film 1 is formed on the upper surface of a transparent substrate 2 is placed on the standard measuring film substrate 22 and irradiated with diffused light from above and the intensity of reflected light is measured by a detector 5. The obtained intensity of reflected light is substituted for a relational expression of the intensity of reflected light and a reflectivity ratio to calculate the reflectivity ratio. The diffusibility or directionality at a time when the substrate uneven film substrate 21 becomes a reflecting plate can be evaluated based on the reflectivity ratio.