| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for eliminating pattern differences, which enable optical proximity effect correction, regardless of the stepper and fine adjustment in accordance with focusing conditions. SOLUTION: An optical attenuator 52 is arranged between a photomask 50 and an optical image 54. The optical attenuator 52 is arranged on an optical path through which optical flux passes. The optical attenuator 52 is provided with a light-transmitting region and an optical decay region, and a filter of an optical decay region is plated with a material which attenuates light intensity and light intensity of an optical attenuated region is lowered. Thereby, light intensity in light-transmitting region and in an optical decay region is made the same. |
