发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor device and its manufacturing method, especially a noncontact recognition device utilizing a thin semiconductor chip, and the structure and manufacturing method of a semiconductor device for producing efficiently. SOLUTION: A semiconductor device is manufactured by applying adhesive resin previously to a thin chip 12 and connecting a thin chip 13 with the electrode on a film substrate 23 while clamping the symmetrically designed film substrate 23 having electrodes and provided with an antenna 11 vertically. Labor can be reduced and incidental facilities can be rationalized by performing connection under wafer state, winding the film substrate into rolls 21, 22 and then cutting the roll into individual chips.</p>
申请公布号 JP2001217380(A) 申请公布日期 2001.08.10
申请号 JP20000032737 申请日期 2000.02.04
申请人 HITACHI LTD 发明人 USAMI MITSUO
分类号 G06K19/07;G06K19/077;H01L21/68;H01L23/12;H01L23/498;H01L25/04;H01L25/18;(IPC1-7):H01L25/04 主分类号 G06K19/07
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